Dissociative attachment of electrons with Si2H6

Krishnakumar, E. ; Srivastava, S. K. (1991) Dissociative attachment of electrons with Si2H6 International Journal of Mass Spectrometry and Ion Processes, 103 (2-3). pp. 107-115. ISSN 0168-1176

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Official URL: http://www.sciencedirect.com/science/article/pii/0...

Related URL: http://dx.doi.org/10.1016/0168-1176(91)80082-X


Cross-sections for the production of negative ion fragments by electron attachment to Si2H6 and ion pair formation from it have been measured by utilizing the crossed electron beam-molecular beam collision technique. The negative ions are mass analyzed by employing a quadrupole mass spectrometer. There are serious disagreements between the present and two previously published results. In the present paper cross-section values, appearance potentials, and the various channels of dissociation for the formation of negative monosilane fragments are presented.

Item Type:Article
Source:Copyright of this article belongs to Elsevier Science.
ID Code:95386
Deposited On:06 Nov 2012 11:42
Last Modified:06 Nov 2012 11:42

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