Photopumped red-emitting InP/In0.5Al0.3Ga0.2P self-assembled quantum dot heterostructure lasers grown by metalorganic chemical vapor deposition

Ryou, J. H. ; Dupuis, R. D. ; Walter, G. ; Kellogg, D. A. ; Holonyak, N. ; Mathes, D. T. ; Hull, R. ; Reddy, C. V. ; Narayanamurti, V. (2001) Photopumped red-emitting InP/In0.5Al0.3Ga0.2P self-assembled quantum dot heterostructure lasers grown by metalorganic chemical vapor deposition Applied Physics Letters, 78 (26). pp. 4091-4093. ISSN 0003-6951

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Official URL: http://apl.aip.org/resource/1/applab/v78/i26/p4091...

Related URL: http://dx.doi.org/10.1063/1.1382622

Abstract

We report the 300 K operation of optically pumped red-emitting lasers fabricated from InP self-assembled quantum dots embedded in In0.5Al0.3Ga0.2P layers on GaAs (100) substrates grown by metalorganic chemical vapor deposition. Quantum dots grown at 650° C on In0.5Al0.3Ga0.2P layers have a high density on the order of 1010 cm-2 and the dominant size of individual quantum dots ranges from -5 to -10 nm for 7.5 monolayer "equivalent growth." These InP/In0.5Al0.3Ga0.2P quantum dot heterostructures are characterized by atomic force microscopy, high-resolution transmission electron microscopy, and photoluminescence. Laser structures are prepared from wafers having two vertically stacked InP quantum dot active layers within a 100-nm-thick In0.5Al0.3Ga0.2P waveguide and upper and lower 600 nm InAlP cladding layers. We observe lasing at λ-680 nm at room temperature in optically pumped samples.

Item Type:Article
Source:Copyright of this article belongs to American Institute of Physics.
Keywords:Semiconductor Quantum Dots; Atomic Force Microscopy; Transmission Electron Microscopy; Photoluminescence; Quantum Well Lasers; III-V Semiconductors; Indium Compounds; Aluminium Compounds; Gallium Compounds; Self-assembly; Optical Pumping; MOCVD Coatings; Waveguide Lasers
ID Code:87535
Deposited On:19 Mar 2012 12:40
Last Modified:19 Mar 2012 12:40

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