Experimental persistence probability for fluctuating steps

Dougherty, D. B. ; Lyubinetsky, I. ; Williams, E. D. ; Constantin, M. ; Dasgupta, C. ; Das Sarma, S. (2002) Experimental persistence probability for fluctuating steps Physical Review Letters, 89 (13). 136102_1-136102_4. ISSN 0031-9007

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Official URL: http://prl.aps.org/abstract/PRL/v89/i13/e136102

Related URL: http://dx.doi.org/10.1103/PhysRevLett.89.136102


The persistence behavior for fluctuating steps on the Si(111)-(√ 3×√ 3)R30° -Al surface was determined by analyzing time-dependent STM images for temperatures between 770 and 970 K. Using the standard persistence definition, the measured persistence probability displays power-law decay with an exponent of θ =0.77± 0.03. This is consistent with the value of θ =3/4 predicted for attachment-detachment limited step kinetics. If the persistence analysis is carried out in terms of return to a fixed-reference position, the measured probability decays exponentially. Numerical studies of the Langevin equation used to model step motion corroborate the experimental observations.

Item Type:Article
Source:Copyright of this article belongs to The American Physical Society.
ID Code:83252
Deposited On:17 Feb 2012 04:10
Last Modified:17 Feb 2012 04:10

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