Photo and electrochemical doping in Ge based chalcogenides

Rajagopalan, S. ; Solomon Harshavardhan, K. ; Singh, Bhanwar ; Chopra, K. L. (1981) Photo and electrochemical doping in Ge based chalcogenides Journal de Physique. Colloques, 42 (C4). C4_911-C4_914. ISSN 0449-1947

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Photo and electrochemical doping of obliquely deposited Ge-chalcogenide films have been studied by AES/XPS techniques. The effect of electrochemical adsorption and photodoping on the optical transmittance is presented. The atomic concentration depth profiles of Ag-sensitized amorphous Ge and Ge0.25Se0.75 films have been established. The chemical state of Ag and the associated chemical changes in the chalcogenide brought about by photo and electrochemical doping processes have been identified. Some details of the built-in columnar structure and stresses in obliquely deposited films have been revealed by the present study.

Item Type:Article
Source:Copyright of this article belongs to Societe francaise de Physique.
ID Code:76413
Deposited On:31 Dec 2011 14:42
Last Modified:31 Dec 2011 14:42

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