Pressure induced effects in bulk amorphous n-type semiconductors (GeSe3.5)100-xBix

Bhatia, K. L. ; Parthasarathy, G. ; Gopal, E. S. R. (1985) Pressure induced effects in bulk amorphous n-type semiconductors (GeSe3.5)100-xBix Journal of Non-Crystalline Solids, 69 (2-3). pp. 189-202. ISSN 0022-3093

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The effect of pressure on the electrical resistivity of amorphous n-type (GeSe3.5)100-xBix been studied in a Bridgeman anvil system up to a pressure of 90 kbar down to liquid nitrogen temperature. A continuous amorphous semiconductor to metal-like solid transition in the undoped GeSe3.5 is observed at room temperature. Incorporation of Bi in the GeSe3.5 network is found to significantly disturb the behaviour of the resistivity with pressure. With increasing Bi concentration a much broader variation in resistivity with pressure is observed. The temperature dependence of the resistivity and activation energy at different pressures is also measured and they are found to be composition dependent. Results are discussed in the light of the Phillips Model of ordered clusters in chalcogenide semiconductors.

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ID Code:71149
Deposited On:25 Nov 2011 12:58
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