R. F. magnetron sputtered tungsten carbide thin films

Srivastava, P. K. ; Vankar, V. D. ; Chopra, K. L. (1986) R. F. magnetron sputtered tungsten carbide thin films Bulletin of Materials Science, 8 (3). pp. 379-384. ISSN 0250-4707

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Official URL: http://www.ias.ac.in/j_archive/bms/8/3/379-384/vie...

Related URL: http://dx.doi.org/10.1007/BF02744149


Thin films of tungsten carbide have been deposited on stainless steel substrates held at 500° C by r.f. reactive magnetron sputtering in two different modes of introducing argon and acetylene gases called normal and high rate mode. A single phase fcc-WC is formed in the normal mode whereas a mixture of A-15-W3C, hexagonal-WC and graphitic- and diamond-carbon is found in the high rate mode. A microhardness value as high as 3200 kgf/mm2 (as compared to the bulk value of 1800 kgf/mm2) is obtained in the film deposited by normal mode.

Item Type:Article
Source:Copyright of this article belongs to Indian Academy of Sciences.
Keywords:Tungsten Carbide; Magnetron Sputtering
ID Code:69118
Deposited On:08 Nov 2011 11:00
Last Modified:18 May 2016 15:39

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