Formation of silicon nanoclusters during the reaction of β-ionone with tetrachlorosilane

Suresh, S. ; Joshi, U. M. ; Vinod, M. P. ; Pavaskar, N. R. ; Vijayamohanan, K. (1997) Formation of silicon nanoclusters during the reaction of β-ionone with tetrachlorosilane Chemistry of Materials, 9 (5). pp. 1186-1190. ISSN 0897-4756

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Official URL: http://pubs.acs.org/doi/abs/10.1021/cm9605680

Related URL: http://dx.doi.org/10.1021/cm9605680

Abstract

The chemical reaction between β-ionone and tetrachlorosilane yields silicon nanoclusters entrapped in a polysiloxane matrix along with a cyclized product of β-ionone as a side product. The IR spectrum observed in the entire region of 1000-1200 cm-1 indicates the polymer chain length, while UV absorption at 320 nm shows the presence of extended π-conjugation in the system. Photoluminescence spectrum shows a broad band with a maximum at 724 nm and is qualitatively similar to that of porous silicon and related q-particles. Transmission electron microscopy and selected area electron diffraction analysis show the presence of embedded nanocrystalline Si particles of average particle size 50-60 nm. ESR spectrum shows a sharp signal with a g value of 2.0138 due to the dangling bonds of silicon clusters, while cyclic voltammetry gives a reversible peak with E½at +1.92 V and an irreversible peak at -0.48 V vs saturated calomel electrode (SCE) confirming the mechanism of reductive silylation of the conjugated ketones.

Item Type:Article
Source:Copyright of this article belongs to American Chemical Society.
ID Code:68866
Deposited On:07 Nov 2011 05:03
Last Modified:07 Nov 2011 05:03

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