Transport gap of nanoparticle-passivated silicon substrates

Ghosh, Batu ; Das, Bikas C. ; Pal, Amlan J. (2010) Transport gap of nanoparticle-passivated silicon substrates Small, 6 (1). pp. 52-57. ISSN 1613-6810

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Official URL: http://onlinelibrary.wiley.com/doi/10.1002/smll.20...

Related URL: http://dx.doi.org/10.1002/smll.200901327

Abstract

The transport gap of nanoparticle-passivated Si substrates is measured by scanning tunneling microscopy. Passivation is achieved using a monolayer of CdSe nanoparticles. It is shown that the transport gap and conduction-band edge of the system change upon passivation. The size of the nanoparticles that passivate the Si substrate is varied to study its effect on the transport gap of the system. Plots of the tunneling current versus voltage show that the transport gap of the system can be tuned by the binding of just a monolayer of suitable nanoparticles. From the normalized density of states, it is shown that the conduction-band edge of the system responds to the size of the nanoparticles. Here, a monolayer of the nanoparticles, which were capped with suitable functional groups, has been formed via electrostatic adsorption with the substrate.

Item Type:Article
Source:Copyright of this article belongs to John Wiley and Sons.
Keywords:CdSe Nanoparticles; Electrostatic Assembly; Monolayers; Surface Passivation; Transport Gaps
ID Code:65791
Deposited On:19 Oct 2011 07:25
Last Modified:19 Oct 2011 07:25

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