Cylindrical magnetron sputtering parameters for the growth of Y1Ba2Cu3O7−x thin films

Pinto, R. ; Gupta, L. C. ; Vijayaraghavan, R. ; Chourey, A. G. ; Shirodkar, V. S. (1990) Cylindrical magnetron sputtering parameters for the growth of Y1Ba2Cu3O7−x thin films Physica C: Superconductivity, 171 (1-2). pp. 131-134. ISSN 0921-4534

Full text not available from this repository.

Official URL: http://www.sciencedirect.com/science/article/pii/0...

Related URL: http://dx.doi.org/10.1016/0921-4534(90)90465-Q

Abstract

We have studied cylindrical hollow cathode magnetron sputtering configuration with the aim of eliminating negative ion back-sputtering and realizing stoichiometric YBaCuO thin films from stoichiometric YBaCuO hollow cylindrical target. Results obtained indicate that under optimized sputtering conditions, YBaCuO films with excellent compositional uniformity within 1% of that of the target can be realized over an area almost 90% of the area covered by the inner diameter of the cylindrical target. Films deposited on unheated < 100 > MgO substrates and post annealed at 920°C in oxygen have shown a superconducting onset at 84 K and a zero resistance transition at 80 K.

Item Type:Article
Source:Copyright of this article belongs to Elsevier Science.
ID Code:61912
Deposited On:15 Sep 2011 11:51
Last Modified:15 Sep 2011 11:51

Repository Staff Only: item control page