Lattice mismatch and surface morphology studies of InxGa1-xAs epilayers grown on GaAs substrates

Pal, R. ; Singh, M. ; Murlidharan, R. ; Agarwal, S. K. ; Pal, D. ; Bose, D. N. (1998) Lattice mismatch and surface morphology studies of InxGa1-xAs epilayers grown on GaAs substrates Bulletin of Materials Science, 21 (4). pp. 313-316. ISSN 0250-4707

[img]
Preview
PDF - Publisher Version
786kB

Official URL: http://www.ias.ac.in/j_archive/bms/21/4/313-316/vi...

Related URL: http://dx.doi.org/10.1007/BF02744959

Abstract

InxGa1-x As (0·06 ≤ x ≤ 0·35) epilayers were grown on GaAs substrates by atmospheric pressure metal organic chemical vapour deposition technique. Surface morphology and lattice mismatch in the InGaAs/GaAs films of different compositions were studied. Cross-hatched patterns were observed on the surface of the epilayers for bulk alloy composition up to x ≈ 0·25. For x>0·3, a rough textured surface morphology was observed.

Item Type:Article
Source:Copyright of this article belongs to Indian Academy of Sciences.
Keywords:Epitaxial Layer; Metal Organic Chemical Vapour Deposition; InGaAs; Lattice Mismatch
ID Code:5739
Deposited On:19 Oct 2010 11:12
Last Modified:16 May 2016 16:11

Repository Staff Only: item control page