The effects of oxygen concentration in sputter-deposited molybdenum films

Bardin, T. T. ; Pronkoz, J. G. ; Budhani, R. C. ; Lin, J. S. ; Bunshah, R. F. (1988) The effects of oxygen concentration in sputter-deposited molybdenum films Thin Solid Films, 165 (1). pp. 243-247. ISSN 0040-6090

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Official URL: http://linkinghub.elsevier.com/retrieve/pii/004060...

Related URL: http://dx.doi.org/10.1016/0040-6090(88)90695-5

Abstract

The quantification of the oxygen contamination in thin molybdenum films was measured, using rutherford backscattering and a nuclear resonant reaction, as a function of deposition conditions. A correlation was found between the oxygen content and electrical properties for films made under specific deposition conditions. The results indicate a decrease in electrical resistivity of the molybdenum films as the amount of oxygen contamination decreases at the higher deposition rates.

Item Type:Article
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ID Code:5635
Deposited On:19 Oct 2010 11:41
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