Fatigue crack growth under an equivalent FALSTAFF spectrum

Mitchenko, E. I. ; Prakash, Raghu V. ; Sunder, R. (1995) Fatigue crack growth under an equivalent FALSTAFF spectrum Fatigue & Fracture of Engineering Materials & Structures, 18 (5). pp. 583-595. ISSN 8756-758X

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Official URL: http://onlinelibrary.wiley.com/doi/10.1111/j.1460-...

Related URL: http://dx.doi.org/10.1111/j.1460-2695.1995.tb01419.x


Optical fractography was used to estimate growth of small cracks at notches under programmed FALSTAFF loading in an Al-Cu alloy. Crack sizes as low as 25 microns and growth rates over two orders of magnitude could be resolved using this technique. Randomized MiniFALSTAFF load sequence was modified into a programmed load equivalent with major loads either preceding or following marker loads. Crack growth rate under programmed FALSTAFF spectrum as estimated by optical fractography conformed to compliance based estimates on a SE(T) specimen. Long crack growth rates under programmed and randomized MiniFALSTAFF spectrum were essentially similar. Spectrum load fatigue crack growth was studied in central hole coupons under notch inelastic conditions. Scatter in growth rates for small notch cracks was found to be of the same magnitude as that of long cracks. Multiple fatigue cracks are observed at the notch root, and they appear to influence each other.

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