Pressure induced crystallization in amorphous silicon

Pandey, K. K. ; Garg, Nandini ; Shanavas, K. V. ; Sharma, Surinder M. ; Sikka, S. K. (2011) Pressure induced crystallization in amorphous silicon Journal of Applied Physics, 109 (11). 113511_1-113511_7. ISSN 0021-8979

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Official URL: http://jap.aip.org/resource/1/japiau/v109/i11/p113...

Related URL: http://dx.doi.org/10.1063/1.3592963

Abstract

We have investigated the high pressure behavior of amorphous silicon (a-Si) using X-ray diffraction and Raman scattering techniques. Our experiments show that a-Si undergoes a polyamorphous transition from the low density amorphous to the high density amorphous phase, followed by pressure induced crystallization to the primitive hexagonal (ph) phase. On the release path, the sequence of observed phase transitions depends on whether the pressure is reduced slowly or rapidly. Using the results of our first principles calculations, pressure induced preferential crystallization to the ph phase is explained in terms of a thermodynamic model based on phenomenological random nucleation and the growth process.

Item Type:Article
Source:Copyright of this article belongs to American Institute of Physics.
Keywords:ab Initio Calculations; Amorphous Semiconductors; Crystallisation; Elemental Semiconductors; High-pressure Effects; Nucleation; Raman Spectra; Silicon; X-ray Diffraction
ID Code:48205
Deposited On:14 Jul 2011 08:33
Last Modified:12 Jul 2012 07:45

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