Krummacher, S. ; Sarma, D. D. (1986) XPS studies of the oxidation of U---Si compounds Surface Science, 178 (1-3). pp. 842-849. ISSN 0039-6028
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Official URL: http://www.sciencedirect.com/science/article/pii/0...
Related URL: http://dx.doi.org/10.1016/0039-6028(86)90359-6
Abstract
XPS studies of the oxidation of U3Si, USi. USi2, and USi3 have shown very similar oxidation behavior for both constituents. Moreover, the oxidation rate in both U- and Si-related signals is found to increase with increasing uranium concentration. The results are interpreted in terms of a combined oxidation of U---Si complexes.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to Elsevier Science. |
| ID Code: | 46441 |
| Deposited On: | 04 Jul 2011 11:36 |
| Last Modified: | 04 Jul 2011 11:36 |
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