Rajumon, M. K. ; Hegde, M. S. ; Rao, C. N. R. (1988) Adsorption of carbon monoxide on Ni/Ti and Ni/TiO2 surfaces preparedin situ in the electron spectrometer: a combined UPS-XPS study Catalysis Letters, 1 (11). pp. 351-359. ISSN 1011-372X
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Official URL: http://www.springerlink.com/content/p6173484820966...
Related URL: http://dx.doi.org/10.1007/BF00766164
Abstract
Adsorption of CO on a clean Ti surface is partly associative at 80 K with a 1π-4σ separation of 4.2 eV, becoming dissociative at 130 K. On Ni- covered Ti surfaces, however, associative adsorption (4σ-1π, 3.3 eV) occurs at 80 K and partial dissociation, around 200 K. TiO2 is reduced more effectively on annealing, when it is covered with Ni. On the surfaces of Ni deposited on TiO2, there is only dissociative adsorption, unlike on Ni/Al2O3 and Ni/TiO2 (non-annealed) surfaces.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to Springer. |
| ID Code: | 44686 |
| Deposited On: | 22 Jun 2011 14:26 |
| Last Modified: | 11 Jul 2012 04:19 |
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