Field-ion microscopic study of antiparallel twins in Ni4Mo

Chandrasekharaiaha, M. N. ; Ranganathan, S. ; Okamoto, P. R. ; Thomas, G. (1972) Field-ion microscopic study of antiparallel twins in Ni4Mo Materials Research Bulletin, 7 (1). pp. 13-17. ISSN 0025-5408

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Official URL: http://linkinghub.elsevier.com/retrieve/pii/002554...

Related URL: http://dx.doi.org/10.1016/0025-5408(72)90064-5

Abstract

Ni4Mo undergoes an order-disorder transformation giving rise to three types of domain boundaries. The field-ion image contrast from one such interface, namely the antiparallel twin boundary, has been studied using computer simulation. Evidence is presented for this effect from the field-ion images of Ni4Mo.

Item Type:Article
Source:Copyright of this article belongs to Elsevier Science.
ID Code:41997
Deposited On:01 Jun 2011 12:58
Last Modified:01 Jun 2011 12:58

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