Electret mechanism, hysteresis, and ambient performance of sol-gel silica gate dielectrics in pentacene field-effect transistors

Cahyadi, T. ; Tan, H. S. ; Mhaisalkar, S. G. ; Lee, P. S. ; Boey, F. ; Chen, Z. -K. ; Ng, C. M. ; Rao, V. R. ; Qi, G. J. (2007) Electret mechanism, hysteresis, and ambient performance of sol-gel silica gate dielectrics in pentacene field-effect transistors Applied Physics Letters, 91 (24). 242107_1-242107_3. ISSN 0003-6951

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Official URL: http://link.aip.org/link/applab/v91/i24/p242107/s1

Related URL: http://dx.doi.org/10.1063/1.2821377

Abstract

The electret induced hysteresis was studied in sol-gel silica films that result in higher drain currents and improved device performance in pentacene field-effect transistors. Vacuum and ambient condition studies of the hysteresis behavior and capacitance-voltage characteristics on single layer and varying thicknesses of bilayer dielectrics confirmed that blocking layers of thermal oxide could effectively eliminate the electret induced hysteresis, and that thin (25 nm) sol-gel silica dielectrics enabled elimination of nanopores thus realizing stable device characteristics under ambient conditions.

Item Type:Article
Source:Copyright of this article belongs to American Institute of Physics.
Keywords:Dielectric Hysteresis; Dielectric Thin Films; Electrets; Field Effect Transistors; Organic Semiconductors; Silicon Compounds; Sol-gel Processing
ID Code:41577
Deposited On:30 May 2011 09:43
Last Modified:30 May 2011 09:43

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