Photoremovable protecting groups in organic synthesis

Rajasekharan Pillai, V. N. (1980) Photoremovable protecting groups in organic synthesis Synthesis, 1980 (1). pp. 1-26. ISSN 0039-7881

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The applications of light-sensitive protecting groups which can be removed by photolysis in the synthesis of organic compounds are reviewed. The use of groups such as 2-nitrobenzyl, benzyloxycarbonyl, 3-nitrophenyl, phenacyl, 3,5-dimethoxybenzoinyl, and 2, 4-dinitrobenzenesulphenyl for the blocking of various functional groups is reviewed with particular emphasis on their application in syntheses involving polyfunctional molecules. The methods for the incorporation of the protecting group, subsequent synthetic steps, and the final removal of the employed protecting group are illustrated with specific examples. The important applications of these groups in carbohydrate chemistry, nucleotide synthesis, and peptide synthesis on polymeric supports are discussed.

Item Type:Article
Source:Copyright of this article belongs to Thieme Medical Publishers.
ID Code:38626
Deposited On:23 May 2011 06:03
Last Modified:23 May 2011 06:03

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