Murthy, T. G. K. ; Rao, H. N. ; Anjaneyulu, K. S. R. (1972) A new approach for the thickness monitoring of optical thin films Vacuum, 22 (4). p. 151. ISSN 0042-207X
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Official URL: http://www.sciencedirect.com/science/article/pii/0...
Related URL: http://dx.doi.org/10.1016/0042-207X(72)90311-9
Abstract
Accurate measurement in situ of the film thickness during the deposition of thin films for optical applications is achieved by a new photoelectric optical system which measures continuously the reflectance or transmittance of a monitoring plate. The necessity for modulating the light beam is eliminated.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to Elsevier Science. |
| ID Code: | 34857 |
| Deposited On: | 11 Apr 2011 12:01 |
| Last Modified: | 18 Nov 2011 06:38 |
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