Monte Carlo calculations for metal-semiconductor hot-electron injection via tunnel-junction emission

Abstract

We present a detailed description of a scheme to calculate the injection current for metal-semiconductor systems using tunnel-junction electron emission. We employ a Monte Carlo framework for integrating over initial free-electron states in a metallic emitter and use interfacial scattering at the metal-semiconductor interface as an independent parameter. These results have implications for modeling metal-base transistors and ballistic electron emission microscopy and spectroscopy.