57ion implantation in laser-deposited cupric and cuprous oxide films: Mossbauer spectroscopy and x-ray-diffraction studies

Ogale, S. B. ; Bilurkar, P. G. ; Joshi, S. ; Marest, G. (1994) 57ion implantation in laser-deposited cupric and cuprous oxide films: Mossbauer spectroscopy and x-ray-diffraction studies Physical Review B, 50 (14). pp. 9743-9751. ISSN 0163-1829

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Official URL: http://prb.aps.org/abstract/PRB/v50/i14/p9743_1

Related URL: http://dx.doi.org/10.1103/PhysRevB.50.9743

Abstract

A systematic study of 57ion implantation in cupric and cuprous oxide films has been reported. The CuO and Cu2O films having excellent stoichiometry were prepared by the technique of laser ablation. The phases formed in the implanted and thermally annealed samples were characterized by Mossbauer spectroscopy and glancing angle x-ray diffraction. For the as-implanted CuO films the Cu6Fe3O7, CuFeO2,β-CuFeO2, and Cu2O phases are detected. The same phases are present in the Cu2O-implanted films with some Cu2O·FeO units, metallic Cu atoms, and CuxFe3-xO4 spinel in addition. Annealing at 400 °C under argon atmosphere produces in both the cases a strong increase of the CuFeO2 and β -CuFeO2 phases at the expense of the Cu6Fe3O7 phase. This latter phase completely vanishes after annealing at 500 °C and new phases, namely α-Fe2O3 and small iron clusters appear. The amount of the CuxFe3-xO4 phase continues to increase after annealing at 500 and 600 °C, whereas CuFeO2 decreases. The α-Fe2O3 contribution disappears after annealing at 600 °C.

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