Narhe, R. D. ; Khandkar, M. D. ; Adhi, K. P. ; Limaye, A. V. ; Sainkar, S. R. ; Ogale, S. B. (2001) Difference in the dynamic scaling behavior of droplet size distribution for coalescence under pulsed and continuous vapor delivery Physical Review Letters, 86 (8). pp. 1570-1573. ISSN 0031-9007
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Official URL: http://prl.aps.org/abstract/PRL/v86/i8/p1570_1
Related URL: http://dx.doi.org/10.1103/PhysRevLett.86.1570
Abstract
Dynamic scaling behavior of the droplet size distribution in the coalescence regime for growth by pulsed laser deposition is studied experimentally and by computer simulation, and the same is compared with that for continuous vapor deposition. The scaling exponent for pulsed deposition is found to be (1.2±0.1), which is significantly lower as compared to that for continuous deposition (1.6±0.1). Simulations reveal that this dramatic difference can be traced to the large fraction of multiple droplet coalescence under pulsed vapor delivery. A possible role of the differing diffusion fields in the two cases is also suggested.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to American Physical Society. |
| ID Code: | 26868 |
| Deposited On: | 08 Dec 2010 13:03 |
| Last Modified: | 11 Jun 2011 11:23 |
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