Reactive-magnetron-sputtered chromium carbide films

Agarwal, V. ; Vankar, V. D. ; Chopra, K. L. (1989) Reactive-magnetron-sputtered chromium carbide films Thin Solid Films, 169 (2). pp. 281-288. ISSN 0040-6090

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Official URL: http://linkinghub.elsevier.com/retrieve/pii/004060...

Related URL: http://dx.doi.org/10.1016/0040-6090(89)90711-6

Abstract

Chromium carbide films were deposited by r.f. reactive magnetron sputtering of chromium in an acetylene plasma. The carbon-to-chromium ratio in the films was found to increase with substrate temperature and acetylene partial pressure, resulting in a supersaturated solid solution of carbon in a chromium matrix and the Cr23C6 phase. The microstructure and composition of the films were found to be very sensitive to the deposition temperature and incorporated hydrogen and hydrocarbon radicals.

Item Type:Article
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ID Code:23138
Deposited On:25 Nov 2010 13:28
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