Electroless deposition of semiconductor films

Sharma, N. C. ; Kainthla, R. C. ; Pandya, D. K. ; Chopra, K. L. (1979) Electroless deposition of semiconductor films Thin Solid Films, 60 (1). pp. 55-59. ISSN 0040-6090

Full text not available from this repository.

Official URL: http://linkinghub.elsevier.com/retrieve/pii/004060...

Related URL: http://dx.doi.org/10.1016/0040-6090(79)90346-8

Abstract

An electroless (solution growth) technique for the deposition of thin films of a variety of multicomponent alloys (e.g. Cd1-xZnxS, Pb1-xHgxS and Cd1-xPbxSe) of II-VI and IV-VI semiconductors has been developed. The technique involves the recombination on a suitably prepared substrate of two or more ions produced during a well-controlled chemical reaction. Films are obtained by an energetic ion-by-ion condensation process and exhibit nucleation and growth stages. The technique allows the preparation of thin films with polymorphic structures and variable compositions.

Item Type:Article
Source:Copyright of this article belongs to Elsevier Science.
ID Code:22973
Deposited On:25 Nov 2010 13:45
Last Modified:28 May 2011 08:47

Repository Staff Only: item control page