The thickness dependence of the electrical and dielectric properties in the laser ablated SrBi2Nb2O9 thin films

Bhattacharyya, S. ; Victor, P. ; Laha, A. ; Krupanidhi, S. B. (2002) The thickness dependence of the electrical and dielectric properties in the laser ablated SrBi2Nb2O9 thin films Integrated Ferroelectrics, 50 (1). pp. 159-169. ISSN 1058-4587

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Related URL: http://dx.doi.org/10.1080/10584580215514

Abstract

The thickness dependence of the electrical properties in the thin films of uniaxial SrBi2Nb2O9 has been studied in this report. According to many published literatures, it could be an effective way to identify the basic conduction process. The laser ablation was chosen as the deposition technique to ensure an oriented growth and a proper stoichiometric deposition. The structural, dielectric and conduction properties were studied as a function of thickness. The films showed good ferroelectric properties, an ordered growth, and a space-charge controlled conduction process, which was double checked by reversing the polarity of the applied voltage, and also by examining the high field current response of the sample varying in thickness.

Item Type:Article
Source:Copyright of this article belongs to Taylor and Francis Ltd.
ID Code:19266
Deposited On:23 Nov 2010 13:13
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