Pulsed excimer laser deposition of ferroelectric thin films

Krupanidhi, S. B. ; Roy, D. ; Maffei, N. ; Peng, C. J. (1992) Pulsed excimer laser deposition of ferroelectric thin films Integrated Ferroelectrics, 1 (2-4). pp. 253-268. ISSN 1058-4587

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Related URL: http://dx.doi.org/10.1080/10584589208215716

Abstract

Pulsed UV excimer laser ablation was employed to deposit multi-axial, bi-axial and uni-axial ferroelectric compositions of PZT, bismuth titanate and lead germanate respectively. In general, a fluence lower than 2 J/cm2 caused a preferential evaporation of volatile components, resulting in stoichiometric imbalance. However, the fluences beyond 2 J/cm2 enabled the deposition of stoichiometric thin films of multi-component oxide systems. The intrinsic bombardment due to the energetic ablated species during the thin film deposition seemed to influence the composition, structure, orientation and the electrical properties. The electrical characterization of ferroelectric films indicated a dielectric constant of 800-1000, a Pr of 32µ C/cm2 and Ec of 130KV/cm for polycrystalline PZT films and the corresponding quantities were measured to be 150, 7 µ C/cm2 and 20 KV/cm for in-situ crystallized c-axis preferred oriented bismuth titanate films. Lead germanate thin films oriented along c-axis (003) showed a dielectric constant of 30, a Pr of 2.5 µ C/cm2 and Ec of 55 KV/cm.

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