Backward switching phenomenon from field forced ferroelectric to antiferroelectric phases in antiferroelectric PbZrO3 thin films

Bharadwaja, S. S. N. ; Krupanidhi, S. B. (2001) Backward switching phenomenon from field forced ferroelectric to antiferroelectric phases in antiferroelectric PbZrO3 thin films Journal of Applied Physics, 89 (8). pp. 4541-4547. ISSN 0021-8979

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Official URL: http://jap.aip.org/resource/1/japiau/v89/i8/p4541_...

Related URL: http://dx.doi.org/10.1063/1.1331659

Abstract

Antiferroelectric materials (example: lead zirconate and modified lead zirconate stannate), in which a field-induced ferroelectric phase transition is feasible due to a small free energy difference between the ferroelectric and the antiferroelectric phases, are proven to be very good candidates for applications involving actuation and high charge storage devices. The property of reverse switching from the field-induced ferroelectric to antiferroelectric phases is studied as a function of temperature, applied electric field, and sample thickness in antiferroelectric lead zirconate thin films deposited by pulsed excimer laser ablation. The maximum released charge density was 22 µ C/cm2 from a stored charge density of 36 µ C/cm2 in a 0.55 µ thick lead zirconate thin film. This indicated that more than 60% of the stored charge could be released in less than 7 ns at room temperature for a field of 200 kV/cm. The content of net released charge was found to increase with increasing field strength, whereas with increasing temperature the released charge was found to decrease. Thickness-dependent studies on lead zirconate thin films showed that size effects relating to extrinsic and intrinsic pinning mechanisms controlled the released and induced charges through the intrinsic switching time. These results proved that antiferroelectric PZ thin films could be utilized in high-speed charge decoupling capacitors in microelectronics applications.

Item Type:Article
Source:Copyright of this article belongs to American Institute of Physics.
ID Code:18850
Deposited On:17 Nov 2010 12:17
Last Modified:06 Jun 2011 09:06

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