Recent advances in physical vapor growth processes for ferroelectric thin films

Krupanidhi, S. B. (1992) Recent advances in physical vapor growth processes for ferroelectric thin films Journal of Vacuum Science & Technology A, 10 (4). pp. 1569-1577. ISSN 0734-2101

Full text not available from this repository.

Official URL: http://avspublications.org/jvsta/resource/1/jvtad6...

Related URL: http://dx.doi.org/10.1116/1.578046

Abstract

Recent developments in the deposition of ferroelectric thin films involving physical vapor depositions are described, which include (a) multimagnetron sputter deposition, (b) multi-ion-beam reactive sputter (MIBERS) deposition, (c) pulsed excimer laser ablation, and (d) electron cyclotron resonance plasma-assisted deposition. The prevailing intrinsic low-energy ion bombardment during the growth process, common to these methods, may be used to control composition, crystallization temperature, and microstructure. A low-energy (60-75 eV) off-normal incidence ion bombardment in the MIBERS technique and a dc glow discharge in the excimer laser ablation of ferroelectric Pb(Zr,Ti)O3 thin films indicated a reduction in the phase formation/crystallization temperature, improved the electrical properties, microstructure, and the surface smoothness. Discussion is presented emphasizing the effects of low-energy ion bombardment during deposition of ferroelectric films.

Item Type:Article
Source:Copyright of this article belongs to American Vacuum Society.
ID Code:18837
Deposited On:17 Nov 2010 12:18
Last Modified:06 Jun 2011 11:35

Repository Staff Only: item control page