XPS and XRD investigations of Dy/Si interface

Gokhale, Shubha ; Ahmed, Nehal ; Mahamuni, Shailaja ; Rao, V. J. ; Nigavekar, A. S. ; Kulkarni, S. K. (1989) XPS and XRD investigations of Dy/Si interface Surface Science, 210 (1-2). pp. 85-98. ISSN 0039-6028

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Official URL: http://linkinghub.elsevier.com/retrieve/pii/003960...

Related URL: http://dx.doi.org/10.1016/0039-6028(89)90104-0

Abstract

The interaction of dysprosium metal atoms with silicon (111) surface at different temperatures has been investigated using X-ray photoelectron spectroscopy and X-ray diffraction analysis. Si 2p and Dy 3d5/2 spectral lines are used to propose the Dy---Si interaction in the interface region. Even at room temperature (300 K) strong interaction between Dy and Si atoms takes place due to charge transfer from Dy to Si. At this temperature, at the interface, a predominantly Dy-rich Dy5Si3 phase is observed. Whereas at an annealing temperature of 623 K a silicon-rich DySi2 - x phase is observed. At an intermediate temperature of 423 K both these phases are seen with some amorphous background.

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ID Code:17928
Deposited On:17 Nov 2010 13:30
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