Influence of different deposition parameters on the properties of hydrogenated amorphous silicon films prepared by magnetron sputtering

Das, Debajyoti ; Banerjee, Ratnabali ; Batabyal, A. K. ; Barua, A. K. (1988) Influence of different deposition parameters on the properties of hydrogenated amorphous silicon films prepared by magnetron sputtering Journal of Non-Crystalline Solids, 103 (1-2). pp. 143-148. ISSN 0022-3093

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Official URL: http://linkinghub.elsevier.com/retrieve/pii/002230...

Related URL: http://dx.doi.org/10.1016/0022-3093(88)90427-9

Abstract

Hydrogenated amorphous silicon films have been reactively sputtered with different flow rates of hydrogen in an Ar-H2 gas mixture. The films have been characterized by optoelectronic and structural properties. The susceptibility to light induced changes has been studied. The effects of variation of the rf power density and the total pressure on the film properties have also been examined. Each of the deposition parameters have been found to exercise considerable control on the film characteristics. Parametric optimisation has yielded encouraging results in terms of film quality.

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