Flat Phonon Band-Based Mechanism of Amorphization of MOF-5 at Ultra-low Pressures

Bhogra, Meha ; Waghmare, Umesh V. (2021) Flat Phonon Band-Based Mechanism of Amorphization of MOF-5 at Ultra-low Pressures Journal of Physical Chemistry C, 125 (27). pp. 14924-14931. ISSN 1932-7447

Full text not available from this repository.

Official URL: http://doi.org/10.1021/acs.jpcc.1c02598

Related URL: http://dx.doi.org/10.1021/acs.jpcc.1c02598

Abstract

MOF-5 is a crystalline metal–organic framework (MOF) with large pore volume and exceptional thermal stability. However, it undergoes irreversible amorphization at surprisingly low pressures of about 10 MPa. While such disruption of framework-topology was attributed to the rupture of− C–O–bonds of the carboxylate groups in its rigid secondary building units (SBUs), these energy-intensive bond-breaking events are unlikely to occur at minuscule pressures of a few MPa.

Item Type:Article
Source:Copyright of this article belongs to American Chemical Society.
ID Code:135802
Deposited On:18 Aug 2023 10:24
Last Modified:18 Aug 2023 10:24

Repository Staff Only: item control page