A physico-chemical approach in binary solid-state interdiffusion

Ghosh, C. ; Paul, A. (2007) A physico-chemical approach in binary solid-state interdiffusion Acta Materialia, 55 (6). pp. 1927-1939. ISSN 1359-6454

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Official URL: http://doi.org/10.1016/j.actamat.2006.10.051

Related URL: http://dx.doi.org/10.1016/j.actamat.2006.10.051


A physico-chemical approach is developed, which can be used in binary diffusion couples to determine diffusion parameters of product phases with a wide homogeneity range, as well as phases with a narrow homogeneity range. It is demonstrated that this approach is basically equivalent to the diffusion-based treatment. However, the physico-chemical approach pedagogically sheds light on the chemical reactions occurring during interdiffusion at the interphase interfaces. This theory can be used in any binary system for any end-member condition to explain single-phase or multiphase diffusion-controlled growth. Ni–Al and Ag–Zn systems are considered here to calculate diffusion parameters following the physico-chemical approach. It is evident from our theoretical analysis and experimental evidence that in the case of presence of a stable Kirkendall marker plane one should expect the presence of duplex grain morphology in a particular phase layer.

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