Stoichiometry and thickness distribution of BaCuO2 and CaCuO2 thin films by off-axis RF sputtering

Nie, J.C ; Sundaresan, A ; Hayashi, A.K ; Ishiura, Y ; Ihara, H (2001) Stoichiometry and thickness distribution of BaCuO2 and CaCuO2 thin films by off-axis RF sputtering Thin Solid Films, 389 (1-2). pp. 261-266. ISSN 0040-6090

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Official URL: http://doi.org/10.1016/S0040-6090(01)00867-7

Related URL: http://dx.doi.org/10.1016/S0040-6090(01)00867-7

Abstract

We have systematically studied the stoichiometry and thickness distribution of BaCuO2 and CaCuO2 thin films deposited by off-axis RF magnetron sputtering. We found a strong dependence of the thickness and composition on axial distance from the target. A gradual and quasi-linear dependence was observed at an axial distance of 70 mm from the target. There is a minimum in the variation of both thickness and composition for all cases at axial distances of 75–95 mm from the target. In this region, the observed thickness drop-off and compositional uniformity over a distance of 20 mm were within 30 and 10%, respectively. Also the variation in the lateral direction was improved within 10% in thickness and 15% in composition, respectively, for a lateral move of 10 mm from the normal axis of the target. A stoichiometrically uniform region as large as 20×20 mm2 was achieved in the optimum region. By selecting a proper region from the target, and by adjusting the target composition according to the stoichiometric distribution, we were able to obtain ideal film growth with a controllable deposition rate, yielding a large area of homogeneous thickness and composition, with the required stoichiometry.

Item Type:Article
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ID Code:120193
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