Deshmukh, Mandar M. ; Ralph, D. C. ; Thomas, M. ; Silcox, J. (1999) Nanofabrication using a stencil mask Applied Physics Letters, 75 (11). pp. 1631-1633. ISSN 0003-6951
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Official URL: http://doi.org/10.1063/1.124777
Related URL: http://dx.doi.org/10.1063/1.124777
Abstract
We describe tests of a technique to fabricate nanostructures by the evaporation of metal through a stencil mask etched in a suspended silicon nitride membrane. Collimated evaporation through the mask gives metal dots less than 15 nm in diameter and lines 15–20 nm wide. We have investigated the extent of hole clogging and the factors which determine the ultimate resolution of the technique.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to AIP Publishing LLC. |
| ID Code: | 117672 |
| Deposited On: | 29 Apr 2021 09:47 |
| Last Modified: | 29 Apr 2021 09:47 |
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