Resistance anomaly and structural disorder in NiSi2 under high pressure

Garg, Alka B. ; Vijayakumar, V. ; Verma, A. K. ; Rao, R. S. ; Godwal, B. K. (2007) Resistance anomaly and structural disorder in NiSi2 under high pressure Journal of Physics and Chemistry of Solids, 68 (3). pp. 367-372. ISSN 0022-3697

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Results of X-ray diffraction, electrical resistance, thermoelectric power measurements and electronic band structure calculations on NiSi2 under high pressure are reported. The thermoelectric power (TEP) changes sign near 0.5 GPa (from +30 to -20 μ V/K). As the pressure is increased, the value of TEP increases further in magnitude and near 7 GPa it becomes -50 μ V/K. The pressure vs. resistance curve measured up to 30 GPa using diamond anvil (DAC)-based technique exhibits a broad hump near 12 GPa and exhibits hysteresis on pressure release. The ADXRD patterns up to 42 GPa show a gradual irreversible loss of long-range order in NiSi2 with the diffraction lines progressively broadening under pressure. The FWHM of the diffraction lines show a rapid increase in the half-widths close to 0.5 GPa and also near 12 GPa. The computed band structure at a compression (without any disorder) corresponding to 12 GPa, exhibits an electronic topological transition (ETT). The rapid increase in disorder above 12 GPa implies that the ETT may be facilitating the structural disorder. It is suggested that the pressure drives the material through a region of entropic and energetic barriers and induces disorder in the material.

Item Type:Article
Source:Copyright of this article belongs to Elsevier Science.
Keywords:C. High Pressure; C. X-Ray Diffraction; D. Phase Transitions; D. Transport Properties
ID Code:11726
Deposited On:13 Nov 2010 13:59
Last Modified:02 Jun 2011 08:39

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