Low erosion behavior of polystyrene films under erbium ion implantation

Bhattacharya, M. ; Sanyal, M. K. ; Chini, T. K. ; Chakraborty, P. (2006) Low erosion behavior of polystyrene films under erbium ion implantation Applied Physics Letters, 88 (7). Article ID 071902. ISSN 0003-6951

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Official URL: http://aip.scitation.org/doi/abs/10.1063/1.2168509

Related URL: http://dx.doi.org/10.1063/1.2168509

Abstract

Erbium ion implantation in Polystyrene (PS) thin films has been performed with 40 and 60 keV ions to a dose range between 1 × 1014 and 1 × 1016 ions/cm2. The X-ray reflectivity technique was applied to determine the ion-induced eroded layer thickness and interestingly, the erosion rate is found to decrease with increasing ion doses exhibiting simple power law behavior of the form ∼(dose)−b. We propose the formation of a carbonaceous network at the top surface, which seems to prevent further erosion of the polymer with increasing the duration of implantation time. These findings may open up a possibility of loading a large amount of erbium in a polymer matrix by the implantation technique to make it suitable for various optoelectronic applications.

Item Type:Article
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ID Code:111436
Deposited On:30 Nov 2017 11:54
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