Wagener, M. ; Murty, B. S. ; Gunther, B. (1996) Preparation of metal nanosuspensions by high-pressure DC-sputtering on running liquids MRS Proceedings, 457 . pp. 149-154. ISSN 1946-4274
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Official URL: https://www.cambridge.org/core/journals/mrs-online...
Related URL: http://dx.doi.org/10.1557/PROC-457-149
Abstract
A modified VERL-process (Vacuum evaporation on running liquids) employing high pressure magnetron sputtering has been used for the preparation of suspensions with metal nanoparticles. The method has been tested for Ag- and Fe-suspensions by varying the pressure of the Argon sputtering atmosphere in the range of 1 to 30 Pa. A narrow particle size distribution with a mean particle size ranging from 5–18 nm has been found. The mean particle size increases with increasing Argon pressure in the pressure range under investigation. A descriptive model for the process of particle formation as a function of sputtering gas pressure is given.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to Cambridge University Press. |
| ID Code: | 110769 |
| Deposited On: | 06 Dec 2017 10:51 |
| Last Modified: | 06 Dec 2017 10:51 |
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