Dip-pen lithography using pens of different thicknesses

John, Neena Susan ; Kulkarni, G. U. (2007) Dip-pen lithography using pens of different thicknesses Journal of Nanoscience and Nanotechnology, 7 (3). pp. 977-981. ISSN 1533-4880

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Official URL: http://www.ingentaconnect.com/contentone/asp/jnn/2...

Related URL: http://dx.doi.org/10.1166/jnn.2007.211


A laboratory method to produce AFM tips of different sizes has been developed based on laser irradiation of the commercial silicon nitride tips. A few shots of 60 mJ at 355 nm were found adequate to induce the desired bluntness from 40 nm to 500 nm in a controlled way. Dip-pen nanolithography (DPN) has been performed with the blunt tips using a colloidal ink consisting of Pd nanocrystals coated with polyvinyl pyrrolidone. The line patterns drawn bear a direct relation with the tip morphology, wider the tip, broader are the patterns, in general. The rate of deposition also increases with the tip dimension, but is not as much proportional for larger tips. The study highlights the potential ability of DPN in integrating nano and microelectronics.

Item Type:Article
Source:Copyright of this article belongs to American Scientific Publishers.
Keywords:Blunt Tips; DPN; Ink Diffusion
ID Code:103063
Deposited On:28 Feb 2017 16:10
Last Modified:28 Feb 2017 16:10

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