Highly conducting patterned Pd nanowires by direct-write electron beam lithography

Bhuvana, T. ; Kulkarni, G. U. (2008) Highly conducting patterned Pd nanowires by direct-write electron beam lithography ACS Nano, 2 (3). pp. 457-462. ISSN 1936-0851

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Official URL: http://pubs.acs.org/doi/abs/10.1021/nn700372h

Related URL: http://dx.doi.org/10.1021/nn700372h

Abstract

Palladium hexadecylthiolate is shown to serve as a negative-tone direct-write electron resist to produce nanopatterns down to 30 nm. The written patterns do not deviate much from the precursor in composition, while a post-treatment at 230 °C in air produced metallic Pd nanowires with residual carbon less than 10% and resistivity close to the bulk value, a desirable property of interconnects in nanocircuitry. The as-written patterns contain small nanocrystals (<5 nm) in a hydrocarbon matrix, which upon annealing aggregate to form well-connected networks of larger nanocrystals (5–15 nm), thus giving rise to metallic conductivity.

Item Type:Article
Source:Copyright of this article belongs to American Chemical Society.
Keywords:Electrical Conductivity; Electron Beam Lithography; Interconnects; Metal Nanowire; Nanopatterning; Thermolysis
ID Code:103049
Deposited On:28 Feb 2017 16:20
Last Modified:28 Feb 2017 16:20

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