Radha, Boya ; Kulkarni, Giridhar U. (2009) A modified micromolding method for sub-100-nm direct patterning of Pd nanowires Small, 5 (20). pp. 2271-2275. ISSN 1613-6810
Full text not available from this repository.
Official URL: http://onlinelibrary.wiley.com/doi/10.1002/smll.20...
Related URL: http://dx.doi.org/10.1002/smll.200900768
Abstract
An unconventional modification of a poly(dimethylsiloxane) stamp hosting microchannels leads to the formation of nanochannels entrapping a precursor, which metallizes into sub-100-nm Pd nanowires under the molding conditions (see image). This is a single-step direct-patterning technique termed nanoentrapment molding.
| Item Type: | Article |
|---|---|
| Source: | Copyright of this article belongs to John Wiley and Sons, Inc. |
| ID Code: | 103034 |
| Deposited On: | 28 Feb 2017 16:51 |
| Last Modified: | 28 Feb 2017 16:51 |
Repository Staff Only: item control page
