ZnO(101) films by pulsed reactive crossed-beam laser ablation

Angappane, S. ; Selvi, N. R. ; Kulkarni, G. U. (2009) ZnO(101) films by pulsed reactive crossed-beam laser ablation Bulletin of Materials Science, 32 (3). pp. 253-258. ISSN 0250-4707

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Official URL: http://www.ias.ac.in/describe/article/boms/032/03/...

Related URL: http://dx.doi.org/10.1007/s12034-009-0038-4


We have employed pulsed reactive crossed-beam laser ablation (PRCLA) to deposit a (101) oriented ZnO film. In this method, a supersonic jet of oxygen pulse is made to cross the laser plume from a zinc metal target while being carried to the Si(111) substrate. The obtained deposit was nanocrystalline ZnO as confirmed by a host of characterization techniques. When the substrate was held at varying temperatures, from room temperature to 900°C, the crystallinity of the obtained films increased as expected, but importantly, the crystallographic orientation of the films was varied. High substrate temperatures produced the usual (001) oriented films, while lower substrate temperatures gave rise to increasingly (101) oriented films. The substrate held at room temperature contained only the (101) orientation. The film morphology also varied with the substrate temperature, from being nanoparticulate to rod-like deposits for higher deposition temperatures. Surprisingly, the (101) orientation showed reactivity with acetone forming carbonaceous nanostructures on the surface.

Item Type:Article
Source:Copyright of this article belongs to Indian Academy of Sciences.
Keywords:ZnO Films; ZnO(101); Pulsed Laser Deposition; Reactive Laser Ablation; Surface Reactivity; Carbon Nanostructures
ID Code:103032
Deposited On:22 Mar 2017 08:50
Last Modified:22 Mar 2017 08:50

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