Microstructural study of iron nitride thin films deposited by ion beam sputtering

Abstract

An amorphous iron nitride thin film was deposited using reactive ion beam sputtering of iron by a beam of argon and nitrogen ions. Nitrogen content in the film as determined from conversion electron Mossbauer spectroscopy (CEMS) and X-ray photoelectron spectroscopy (XPS) was FeN_0.7. The mass density of the film was calculated using energy-dispersive X-ray reflectivity (EDXRR) measurements and is found to be 6.0 gm/cm³. CEMS shows that the film is nonmagnetic in nature. Morphology of the film is obtained from atomic force microscopy (AFM). The surface roughness of the film does not increase appreciably beyond that of the substrate even after a deposition of 131 nm of material with these qualities the film is a good candidate for the multilayer superstructure of a nuclear Bragg monochromator of the type ⁵⁶FeN_0.7/⁵⁷FeN_0.7.