Resonance enhancement of x-rays and fluorescence yield from marker layers in thin films

Ghose, S. K. ; Dev, B. N. ; Gupta, Ajay (2001) Resonance enhancement of x-rays and fluorescence yield from marker layers in thin films Physical Review B, 64 (23). pp. 233403-233406. ISSN 0163-1829

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Official URL: http://prb.aps.org/abstract/PRB/v64/i23/e233403

Related URL: http://dx.doi.org/10.1103/PhysRevB.64.233403

Abstract

Resonance enhancement of x rays in a thin film and fluorescence emission from embedded marker layers within the film have been studied. With embedded marker layers of Ti, Fe, and W at different depths in a thin Si film on a Au-coated Si substrate, it has been shown that the position of a marker layer throughout the depth of the film can be unambiguously determined with a precision better than 0.5 nm. In this example, field-intensity enhancement upto 16 times have been observed. Field enhancement gives rise to enhanced sensitivity. The usefulness of this resonance-enhanced x-ray fluorescence spectrometry in the study of diffusion with marker layers in thin films including polymers and nanocomposites has been elucidated.

Item Type:Article
Source:Copyright of this article belongs to American Physical Society.
ID Code:10041
Deposited On:02 Nov 2010 10:03
Last Modified:16 May 2016 19:43

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