Probing semiconductor band structures and heterojunction interface properties with ballistic carrier emission: GaAs/AlxGa1-xAs as a model system

Yi, Wei ; Narayanamurti, Venkatesh ; Lu, Hong ; Gossard, Arthur C. (2010) Probing semiconductor band structures and heterojunction interface properties with ballistic carrier emission: GaAs/AlxGa1-xAs as a model system Physical Review B: Condensed Matter and Materials Physics, 81 (23). 235325_1-235325_13. ISSN 1098-0121

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Official URL: http://prb.aps.org/abstract/PRB/v81/i23/e235325

Related URL: http://dx.doi.org/10.1103/PhysRevB.81.235325

Abstract

Utilizing three-terminal tunnel emission of ballistic electrons and holes in a planar tunnel transistor with a Mott-barrier collector, we have developed a method to self-consistently determine the energy gap of a semiconductor and band discontinuities at a semiconductor heterojunction without using a priori material parameters. Measurements are performed on lattice-matched GaAs/AlxGa1-x. As (100) single-barrier double heterostructures with AlxGa1-xAs as the model ternary III-V compounds. Electronic band gaps of the AlGaAs alloys and band offsets at the GaAs/AlGaAs (100) interfaces are measured with a resolution of several meV at 4.2 K. The direct-gap Γ band offset ratio for the GaAs/AlGaAs (100) interface is found to be 59:41 (± 3%). Reexamination of our previous experiment [ W. Yi et al. Appl. Phys. Lett. 95 112102 (2009)] revealed that, in the indirect-gap regime, ballistic electrons from direct tunnel emissions probe the X valley in the conduction band, while those from Auger-like scattering processes in the metal base film probe the higher-lying L valley. Such selective electron collection may be explained by their different momentum distributions and parallel momentum conservation at the quasiepitaxial Al/GaAs (100) interface. We argue that the present method is in principle applicable to arbitrary type-I semiconductor heterostructures.

Item Type:Article
Source:Copyright of this article belongs to The American Physical Society.
ID Code:87561
Deposited On:19 Mar 2012 12:49
Last Modified:19 Mar 2012 12:49

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