Items where Author is "Banerjee, Ratnabali"Group by: Item Type | No Grouping Jump to: Article Number of items: 12. ArticleDas, Debabrata ; Sharma, S. N. ; Banerjee, D. ; Barua, A. K. ; Banerjee, Ratnabali (1996) Influence of chamber pressure on optoelectronic and structural properties of boron-doped hydrogenated silicon films prepared by rf magnetron sputtering Japanese Journal of Applied Physics, 35 (5A). pp. 2548-2556. ISSN 0021-4922 Das, Debabrata ; Sharma, S. N. ; Bhattacharyya, T. K. ; Chattopadhyay, S. ; Barua, A. K. ; Banerjee, Ratnabali (1996) Deposition of boron doped a-Si:H films by a novel combination of rf glow discharge technique and filament heating: enhancement of doping efficiency Solid State Communications, 97 (9). pp. 769-776. ISSN 0038-1098 Banerjee, Ratnabali ; Bhattacharyya, T. K. ; Sharma, S. N. ; Batabyal, A. K. ; Barua, A. K. ; Banerjee, Dipali ; Bhusari, D. M. ; Kshirsagar, S. T. (1995) Role of boron in the structural and electronic properties of hydrogenated silicon films deposited by r.f. magnetron sputtering Philosophical Magazine Part B, 71 (2). pp. 115-125. ISSN 0958-6644 Sharma, S. N. ; Bandyopadhyay, A. K. ; Banerjee, Ratnabali ; Batabyal, A. K. ; Barua, A. K. ; Abbi , S. C. (1991) Laser-induced structural changes in magnetron-sputtered hydrogenated microcrystalline silicon films Physical Review B, 43 (5). pp. 4503-4506. ISSN 0163-1829 Banerjee, Ratnabali ; Bandyopadhyay, A. K. ; Rath, J. K. ; Batabyal, A. K. ; Barua, A. K. (1990) Properties of hydrogenated amorphous Si-N films prepared by r.f. magnetron sputtering with emphasis on the non-stoichiometric region Thin Solid Films, 192 (2). pp. 295-307. ISSN 0040-6090 Banerjee, Ratnabali ; Das, Debajyoti ; Batabyal, A. K. ; Barua, A. K. (1989) Effect of deposition temperature on the properties of magnetron sputtered hydrogenated amorphous silicon films Japanese Journal of Applied Physics, 28 (8). pp. 1320-1322. ISSN 0021-4922 Das, Debajyoti ; Banerjee, Ratnabali ; Batabyal, A. K. ; Barua, A. K. (1988) Light-induced changes in magnetron-sputtered hydrogenated amorphous silicon films Thin Solid Films, 164 . pp. 227-231. ISSN 0040-6090 Das, Debajyoti ; Banerjee, Ratnabali ; Batabyal, A. K. ; Barua, A. K. (1988) Influence of different deposition parameters on the properties of hydrogenated amorphous silicon films prepared by magnetron sputtering Journal of Non-Crystalline Solids, 103 (1-2). pp. 143-148. ISSN 0022-3093 Banerjee, Ratnabali ; Ray, Swati ; Batabyal, A. K. ; Barua, A. K. ; Sen, Suchitra (1985) Structural characterization of tin doped indium oxide films prepared by magnetron sputtering Journal of Materials Science, 20 (8). pp. 2937-2944. ISSN 0022-2461 Ray, Swati ; Banerjee, Ratnabali ; Barua, A. K. (1982) Some properties of indium-and antimony-doped vacuum-evaporated CdS thin films Thin Solid Films, 87 (1). pp. 63-71. ISSN 0040-6090 Ray, Swati ; Banerjee, Ratnabali ; Barua, A. K. (1981) The properties of bismuth-doped vacuum-evaporated CdS films Thin Solid Films, 79 (2). pp. 155-160. ISSN 0040-6090 Ray, Swati ; Banerjee, Ratnabali ; Barua, A. K. (1980) Properties of vacuum-evaporated CdS thin films Japanese Journal of Applied Physics, 19 (10). pp. 1889-1895. ISSN 0021-4922 |

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