Effect of substrate on the crystallographic texture and microstructure evolution in Titanium Nitride thin films

Abstract

Nanocrystalline TiN films were deposited on glass, quartz, 316LN nuclear grade stainless steel, silicon (400) and LaO(110) by DC reactive magnetron sputtering in a 100% pure nitrogen atmosphere at ambient temperature. The effect of substrate on the crystallographic texture and microstructure of the films were investigated. Independent of the substrates, films exhibited nanocrystalline peaks and oriented in both (111) and (200) planes. The average crystallite size on the amorphous substrates was 28nm, whereas it increased to 37 nm on 316LN steel and 51 nm for LaO. Surface topographic images revealed that depending on the substrate the films were composed of nanoparticles of size ranging from 85 to 144 nm.