Islam, Md. Nurul ; Ghosh, T. B. ; Chopra, K. L. ; Acharya, H. N. (1996) XPS and X-ray diffraction studies of aluminum-doped zinc oxide transparent conducting films Thin Solid Films, 280 (1-2). pp. 20-25. ISSN 0040-6090
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Official URL: http://linkinghub.elsevier.com/retrieve/pii/004060...
Related URL: http://dx.doi.org/10.1016/0040-6090(95)08239-5
Abstract
Aluminum-doped zinc oxide transparent conducting films are prepared by spray pyrolysis at different dopant concentrations. These films are subsequently characterized by X-ray diffractometric and X-ray photoelectron spectroscopic (XPS) techniques. The results are compared with those obtained from pure zinc oxide films prepared under identical conditions. X-ray diffraction measurements show an increase in lattice parameters (c and a) for aluminum-doped films while their ratio remains the same. This study also indicates that within the XPS detection limit the films are chemically identical to pure zinc oxide. However, a difference in the core-electron line shape of the Zn 2p3/2 photoelectron peaks is predicted. An asymmetry in Zn 2p3/2 photoelectron peaks has been observed for aluminium-doped films. The asymmetry parameters evaluated from core-electron line-shape analysis yield a value of the order of 0.04±0.01. The value is found to lie between those obtained for pure zinc oxide and has been attributed to the presence of excess zinc in the films.
Item Type: | Article |
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Source: | Copyright of this article belongs to Elsevier Science. |
Keywords: | X-ray diffraction; X-ray photoelectron spectroscopy; Zinc oxide |
ID Code: | 22972 |
Deposited On: | 25 Nov 2010 13:45 |
Last Modified: | 28 May 2011 04:24 |
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