XPS and X-ray diffraction studies of aluminum-doped zinc oxide transparent conducting films

Islam, Md. Nurul ; Ghosh, T. B. ; Chopra, K. L. ; Acharya, H. N. (1996) XPS and X-ray diffraction studies of aluminum-doped zinc oxide transparent conducting films Thin Solid Films, 280 (1-2). pp. 20-25. ISSN 0040-6090

Full text not available from this repository.

Official URL: http://linkinghub.elsevier.com/retrieve/pii/004060...

Related URL: http://dx.doi.org/10.1016/0040-6090(95)08239-5

Abstract

Aluminum-doped zinc oxide transparent conducting films are prepared by spray pyrolysis at different dopant concentrations. These films are subsequently characterized by X-ray diffractometric and X-ray photoelectron spectroscopic (XPS) techniques. The results are compared with those obtained from pure zinc oxide films prepared under identical conditions. X-ray diffraction measurements show an increase in lattice parameters (c and a) for aluminum-doped films while their ratio remains the same. This study also indicates that within the XPS detection limit the films are chemically identical to pure zinc oxide. However, a difference in the core-electron line shape of the Zn 2p3/2 photoelectron peaks is predicted. An asymmetry in Zn 2p3/2 photoelectron peaks has been observed for aluminium-doped films. The asymmetry parameters evaluated from core-electron line-shape analysis yield a value of the order of 0.04±0.01. The value is found to lie between those obtained for pure zinc oxide and has been attributed to the presence of excess zinc in the films.

Item Type:Article
Source:Copyright of this article belongs to Elsevier Science.
Keywords:X-ray diffraction; X-ray photoelectron spectroscopy; Zinc oxide
ID Code:22972
Deposited On:25 Nov 2010 13:45
Last Modified:28 May 2011 04:24

Repository Staff Only: item control page