Chand, Madhavi ; Mishra, Archana ; Xiong, Y. M. ; Kamlapure, Anand ; Chockalingam, S. P. ; Jesudasan, John ; Bagwe, Vivas ; Mondal, Mintu ; Adams, P. W. ; Tripathi, Vikram ; Raychaudhuri, Pratap (2009) Temperature dependence of resistivity and Hall coefficient in strongly disordered NbN thin films Physical Review B, 80 (13). Article ID 134514. ISSN 1098-0121
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Official URL: https://journals.aps.org/prb/abstract/10.1103/Phys...
Related URL: http://dx.doi.org/10.1103/PhysRevB.80.134514
Abstract
We report the temperature dependence of resistivity (ρ) and Hall coefficient (RH) in the normal state of homogeneously disordered epitaxial NbN thin films with kFl∼1.68–10.12. The superconducting transition temperature (Tc) of these films varies from 2.7 to 16.8 K. While our least disordered film displays usual metallic behavior, for all the films with kFl≤8.13, both dρ/dT and dRH/dT are negative up to 285 K. We observe that RH(T) varies linearly with ρ(T) for all the films and [RH(T)−RH(285 K)/RH(285 K)]=γ[ρ(T)−ρ(285 K)/ρ(285 K)], where γ=0.68±0.11. Measurements performed on a 2-nm-thick Be film show similar behavior with γ=0.69. This behavior is inconsistent with existing theories of localization and e−e interactions in a disordered metal.
Item Type: | Article |
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Source: | Copyright of this article belongs to American Physical Society. |
ID Code: | 105113 |
Deposited On: | 25 Dec 2017 11:35 |
Last Modified: | 25 Dec 2017 11:35 |
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